Research article Special Issues

Acceleration of solving drift-diffusion equations enabled by estimation of initial value at nonequilibrium

  • Received: 27 January 2024 Revised: 28 March 2024 Accepted: 02 April 2024 Published: 15 April 2024
  • In this study, a novel method enabled by estimation of initial value guess at nonequilibrium was proposed to accelerate drift-diffusion equations in semiconductor device simulation. The initial value guess was obtained by solving analytical model about electrical potential with the decoupling algorithm. By obtaining the initial value directly at the target bias voltage, the proposed method eliminated time-consuming bias ramping process in the classical method starting from the equilibrium state, thereby accelerating the whole process. The method has been applied to a junction barrier Schottky (JBS) diode for validation. Numerical results showed that the proposed method achieves convergence within 10 iterations at several reverse bias voltages, achieving significant reduction of iteration number compared to the classical method using the bias ramping process. It demonstrated that the proposed method holds high feasibility to facilitate the semiconductor device property prediction in relatively regular device structure in the case of low current. With further improvements, this method can also be applied to more complex devices.

    Citation: Chunlin Du, Yu Zhang, Haolan Qu, Haowen Guo, Xinbo Zou. Acceleration of solving drift-diffusion equations enabled by estimation of initial value at nonequilibrium[J]. Networks and Heterogeneous Media, 2024, 19(1): 456-474. doi: 10.3934/nhm.2024020

    Related Papers:

  • In this study, a novel method enabled by estimation of initial value guess at nonequilibrium was proposed to accelerate drift-diffusion equations in semiconductor device simulation. The initial value guess was obtained by solving analytical model about electrical potential with the decoupling algorithm. By obtaining the initial value directly at the target bias voltage, the proposed method eliminated time-consuming bias ramping process in the classical method starting from the equilibrium state, thereby accelerating the whole process. The method has been applied to a junction barrier Schottky (JBS) diode for validation. Numerical results showed that the proposed method achieves convergence within 10 iterations at several reverse bias voltages, achieving significant reduction of iteration number compared to the classical method using the bias ramping process. It demonstrated that the proposed method holds high feasibility to facilitate the semiconductor device property prediction in relatively regular device structure in the case of low current. With further improvements, this method can also be applied to more complex devices.



    加载中


    [1] D. Vasileska, S. M. Goodnick, G. Klimeck, Computational Electronics: Semiclassical and Quantum Device Modeling and Simulation, Boca Raton: CRC press, 2017. https://doi.org/10.1201/b13776
    [2] SILVACO International, ATLAS User's Manual: Device Simulation Software, 2019.
    [3] P. Farrell, N. Rotundo, D. H. Doan, M. Kantner, J. Fuhrmann, T. Koprucki, Drift-diffusion Models, in J. Piprek, Handbook of Optoelectronic Device Modeling and Simulation: Lasers, Modulators, Photodetectors, Solar Cells, and Numerical Methods, Vol. 2, Boca Raton: CRC Press, 2017,733–772. https://doi.org/10.4324/9781315152318
    [4] S. Selberherr, Analysis and Simulation of Semiconductor Devices, Vienna: Springer, 2012. https://doi.org/10.1007/978-3-7091-8752-4
    [5] R. E. Bank, D. J. Rose, W. Fichtner, Numerical methods for semiconductor device simulation, IEEE Trans. Electron Devices, 30 (1983), 1031–1041. https://doi.org/10.1109/T-ED.1983.21257 doi: 10.1109/T-ED.1983.21257
    [6] S. J. Polak, C. Den Heijer, W. H. A. Schilders, P. Markowich, Semiconductor device modelling from the numerical point of view, Int. J. Numer. Methods Eng., 24 (1987), 763–838. https://doi.org/10.1002/nme.1620240408 doi: 10.1002/nme.1620240408
    [7] R. D. Lazarov, I. D. Mishev, P. S. Vassilevski, Finite volume methods for convection-diffusion problems, SIAM J. Numer. Anal., 33 (1996), 31–55. https://doi.org/10.1137/0733003 doi: 10.1137/0733003
    [8] C. Chainais-Hillairet, J. G. Liu, Y. J. Peng, Finite volume scheme for multi-dimensional drift-diffusion equations and convergence analysis, ESAIM. Math. Model. Numer. Anal., 37 (2003), 319–338. https://doi.org/10.1051/m2an:2003028 doi: 10.1051/m2an:2003028
    [9] S. C. Han, S. M. Hong, Deep neural network for generation of the initial electrostatic potential profile, 2019 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), IEEE, Udine, Italy, 2019, 1–4. https://doi.org/10.1109/SISPAD.2019.8870521
    [10] X. Jia, H. An, Y. Hu, Z. Mo, A physics-based strategy for choosing initial iterate for solving drift-diffusion equations, Comput. Math. Appl., 131 (2023), 1–13. https://doi.org/10.1016/j.camwa.2022.11.029 doi: 10.1016/j.camwa.2022.11.029
    [11] K. W. Lee, S. M. Hong, Acceleration of semiconductor device simulation using compact charge model, Solid-State Electron., 199 (2023), 108526. https://doi.org/10.1016/j.sse.2022.108526 doi: 10.1016/j.sse.2022.108526
    [12] Q. Zhang, Q. Wang, L. Zhang, B. Lu, A class of finite element methods with averaging techniques for solving the three-dimensional drift-diffusion model in semiconductor device simulations, J. Comput. Phys., 458 (2022), 111086. https://doi.org/10.1016/j.jcp.2022.111086 doi: 10.1016/j.jcp.2022.111086
    [13] J. W. Slotboom, Computer-aided two-dimensional analysis of bipolar transistors, IEEE Trans. Electron Devices, 20 (1973), 669–679. https://doi.org/10.1109/T-ED.1973.17727 doi: 10.1109/T-ED.1973.17727
    [14] M. A. der Maur, M. Povolotskyi, F. Sacconi, A. D. Carlo, TiberCAD: A new multiscale simulator for electronic and optoelectronic devices, Superlattices Microstruct., 41 (2007), 381–385. https://doi.org/10.1016/j.spmi.2007.03.011 doi: 10.1016/j.spmi.2007.03.011
    [15] P. Farrell, D. Peschka, Nonlinear diffusion, boundary layers and nonsmoothness: Analysis of challenges in drift–diffusion semiconductor simulations, Comput. Math. Appl., 78 (2019), 3731–3747. https://doi.org/10.1016/j.camwa.2019.06.007 doi: 10.1016/j.camwa.2019.06.007
    [16] S. P. Chin, C. Y. Wu, A new methodology for two-dimensional numerical simulation of semiconductor devices, IEEE Trans. Comput. Aided Des. Integr. Circuits Syst., 11 (1992), 1508–1521. https://doi.org/10.1109/43.180264 doi: 10.1109/43.180264
    [17] G. Sabui, P. J. Parbrook, M. Arredondo-Arechavala, Z. J. Shen, Modeling and simulation of bulk gallium nitride power semiconductor devices, AIP Adv., 6 (2016), 055006. https://doi.org/10.1063/1.4948794 doi: 10.1063/1.4948794
    [18] R. Eymard, T. Gallouët, R. Herbin, Finite volume methods, Handb. Numer. Anal., 7 (2000), 713–1018. https://doi.org/10.1016/S1570-8659(00)07005-8 doi: 10.1016/S1570-8659(00)07005-8
    [19] C. Chainais-Hillairet, Entropy method and asymptotic behaviours of finite volume schemes, In: J. Fuhrmann, M. Ohlberger, C. Rohde, Finite Volumes for Complex Applications Ⅶ-Methods and Theoretical Aspects, Cham: Springer, 77 (2014), 17–35. https://doi.org/10.1007/978-3-319-05684-5_2
    [20] J. J. H. Miller, W. H. A. Schilders, S. Wang, Application of finite element methods to the simulation of semiconductor devices, Rep. Prog. Phys., 62 (1999), 277. https://doi.org/10.1088/0034-4885/62/3/001 doi: 10.1088/0034-4885/62/3/001
    [21] H. K. Gummel, A self-consistent iterative scheme for one-dimensional steady state transistor calculations, IEEE Trans. Electron Devices, 11 (1964), 455–465. https://doi.org/10.1109/T-ED.1964.15364 doi: 10.1109/T-ED.1964.15364
    [22] H. C. Elman, D. J. Silvester, A. J. Wathen, Finite Elements and Fast Iterative Solvers: With Applications in Incompressible Fluid Dynamics, 2 Eds., New York: Oxford University Press, 2014. https://doi.org/10.1093/acprof:oso/9780199678792.001.0001
    [23] R. Radhakrishnan, J. H. Zhao, A 2-dimensional fully analytical model for design of high voltage junction barrier Schottky (JBS) diodes, Solid-State Electron., 63 (2011), 167–176. https://doi.org/10.1016/j.sse.2011.06.002 doi: 10.1016/j.sse.2011.06.002
    [24] L. D. Benedetto, G. D. Licciardo, T. Erlbacher, A. J. Bauer, S. Bellone, Analytical model and design of 4H-SiC planar and trenched JBS diodes, IEEE Trans. Electron Devices, 63 (2016), 2474–2481. https://doi.org/10.1109/TED.2016.2549599 doi: 10.1109/TED.2016.2549599
    [25] M. Mehrota, B. J. Baliga, Very low forward drop JBS rectifiers fabricated using submicron technology, IEEE Trans. Electron Devices, 40 (1993), 2131–2132. https://doi.org/10.1109/16.239813 doi: 10.1109/16.239813
  • Reader Comments
  • © 2024 the Author(s), licensee AIMS Press. This is an open access article distributed under the terms of the Creative Commons Attribution License (http://creativecommons.org/licenses/by/4.0)
通讯作者: 陈斌, bchen63@163.com
  • 1. 

    沈阳化工大学材料科学与工程学院 沈阳 110142

  1. 本站搜索
  2. 百度学术搜索
  3. 万方数据库搜索
  4. CNKI搜索

Metrics

Article views(963) PDF downloads(77) Cited by(0)

Article outline

Figures and Tables

Figures(6)  /  Tables(4)

Other Articles By Authors

/

DownLoad:  Full-Size Img  PowerPoint
Return
Return

Catalog